25.8.2
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Lithography Process Control

Sarath Chandra Samudrala

Level: Intermediate Length: 7 hours Format: In-Person Lecture Intended Audience: Lithography engineers and managers who already have a background in lithography science and need to improve skills in process control. Description: The class connects lithographic science to process control, and appropriate statistical methods useful for lithographers are introduced. Specific topics include: - Statistical process control, focusing on aspects particular to lithography - Efficient measurement sampling plans for achieving desired accuracy - Cause-and-effect diagrams in the context of lithography - Control issues specific to critical dimensions - Control issues specific to overlay - Control issues specific to EUV lithography - Edge placement errors - Yield issues specific to lithography - Metrology for lithographic applications - Automatic process control - Control of operations Learning Outcomes: This course will enable you to: - control linewidths, overlay and lithography-induced defects - identify sources of process variation specific to EUV lithography - apply cause-and-effect diagrams to situations in lithography - generate optimized measurement plans - apply statistical process control to situations in lithography Instructor(s): Harry J. Levinson has worked for nearly four decades in the field of lithography. He has published numerous articles on lithographic science, on topics ranging from thin film optical effects and metrics for imaging, to overlay and process control, and he is the author of three books, Lithography Process Control, Principles of Lithography, and Extreme Ultraviolet Lithography. He holds over 70 US patents. Dr. Levinson is an SPIE Fellow, previously chaired the SPIE Publications Committee, and served on SPIE’s Board of Directors. In recognition of his contributions to SPIE, Dr. Levinson received the Society’s 2014 Directors’ Award. He has a BS in engineering from Cornell University and a PhD in physics from the University of Pennsylvania. Event: SPIE Advanced Lithography + Patterning 2023 Course Held: 26 February 2023

Issued on

March 22, 2023

Expires on

Does not expire