Lithography Process Control

Level: Intermediate Length: 7 hours Format: In-Person Lecture Intended Audience: Lithography engineers and managers who already have a background in lithography science and need to improve skills in process control. Description: The class connects lithographic science to process control. Specific topics include:
- Statistical process control, focusing on aspects particular to lithography
- Efficient measurement sampling plans for achieving desired accuracy
- Control issues specific to critical dimensions
- Characterization and measurement of line-edge roughness (LER)
- Control issues specific to overlay
- Control issues specific to EUV lithography
- Yield issues specific to lithography
- Metrology for lithographic applications
- Automatic process control
- Control of operations
Material level is intermediate. Some advanced topics are introduced. Learning Outcomes: This course will enable you to: - identify sources of process variation specific to EUV lithography - control linewidths, overlay, and lithography-induced defects - generate optimized measurement plans - apply statistical methods to situations in lithography Instructor(s): Harry J. Levinson has worked for over four decades in the field of lithography. He has published numerous articles on lithographic science, on topics ranging from thin film optical effects and metrics for imaging, to overlay and process control, and he is the author of three books, Lithography Process Control, Principles of Lithography, and Extreme Ultraviolet Lithography. He holds over 70 US patents. Dr. Levinson is an SPIE Fellow, previously chaired the SPIE Publications Committee, and served on SPIE’s Board of Directors. In recognition of his contributions to SPIE, Dr. Levinson received the Society’s 2014 Directors’ Award. He is the 2022 recipient of the SPIE Frits Zernike Award in Microlithography. Dr. Levinson is currently Editor-in-Chief of the Journal of Micro/Nanopatterning, Materials, and Metrology (JM3). He has a BS in engineering from Cornell University and a PhD in physics from the University of Pennsylvania. Event: SPIE Advanced Lithography + Patterning 2025 Course Held: 23 February 2025